Nanoimprint lithography: 2D or not 2D? A review
نویسندگان
چکیده
منابع مشابه
2D or not 2D? That is the question.
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The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
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Lithography as developed for IC device fabrication is a high volume high accuracy patterning technology with strong 2 dimensional (2D) characteristics. This 2D nature makes it a challenge to integrate this technology in a 3 dimensional (3D) manufacturing environment. This article addresses the performance of a waferstepper (ASML PAS5000) in several 3D processes ranging form waferbonding and thi...
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ژورنال
عنوان ژورنال: Applied Physics A
سال: 2015
ISSN: 0947-8396,1432-0630
DOI: 10.1007/s00339-015-9106-3